The SUSS MJB 3 Mask Aligner is designed for high resolution photolithography in a laboratory, development or pilot production environment. The product fine offers unsurpassed flexibility in the handling of irregularly shaped substrates and pieces of differing thicknesses, as well as standard size wafers up to 3" in diameter.
With the modular construction, the equipment lends itself to ease of service; functional groups are easily accessible and assemblies can be quickly modified or exchanged.
Various configurations are characterized by different fight sources and alignment modes.